| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5353486 | Applied Surface Science | 2016 | 4 Pages |
Abstract
We present a systematic study of energetic N2+ ions (0.1-5Â keV) interaction with clean c-plane Al2O3 surface in situ in a UHV system equipped with X-ray Photoelectron Spectroscopy at room temperature. Results show that maximum thickness of surface is nitride by 5Â keV N2+ ion with an optimal fluence of 1.5Â ÃÂ 1015Â ions/cm2. This modified surface can be used as a template for low defect III-nitrides growth, with enhanced lattice matching than on bare c-Al2O3.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Praveen Kumar, Pooja Devi, Mahesh Kumar, S.M. Shivaprasad,