| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5353555 | Applied Surface Science | 2013 | 4 Pages |
Abstract
The precursor solution was prepared with copper acetate (Cu(OAc)2) as the start material, acrylic acid (AA) as the chemical modifier, and absolute methanol (MEOH) as the solvent. AA reacted with Cu(OAc)2 to form the copper complex with the photosensitivity. In the complex, Cu ion is coordinated with two hydroxy oxygen atoms of AA. The coated gel film using this precursor solution exhibited photosensitivity to UV light at around 245Â nm. Based on the photosensitivity, the patterned CuO film was fabricated.
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Authors
H.L. Zhang, G.Y. Zhao, L.Z. Xu,