Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5353581 | Applied Surface Science | 2014 | 5 Pages |
Abstract
- It is difficult to deposit Al2O3 thin films on pristine graphene directly.
- H2O pulses pretreatment can enhance the Al2O3 coverage on pristine graphene.
- Uniform Al2O3 thin films can grow on the graphene after dipping pretreatment.
- No defects are produced in graphene after dipping pretreatment.
- It is easier to deposit Al2O3 on CVD graphene than exfoliated graphene.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yan-Qiang Cao, Zheng-Yi Cao, Xin Li, Di Wu, Ai-Dong Li,