Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5353786 | Applied Surface Science | 2013 | 7 Pages |
Abstract
⸠ZAO films were prepared by DC reactive magnetron sputtering method by two individual high purity metallic targets of Zn and Al. ⸠Sputtering deposition conditions were optimized to exhibit a good surface roughness for light scattering and low resistivities. ⸠A low resistivity of 2.18 Ã 10â4 Ω cm and mobility of 46 cm2 Vâ1 sâ1 obtained for ZAO film annealed at 400 °C.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
B. Rajesh Kumar, T. Subba Rao,