Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5353821 | Applied Surface Science | 2013 | 4 Pages |
Abstract
⸠Mechanical stresses in PECVD silicon carbonitride films are mainly intrinsic. ⸠Volume changes in growing film correlate with PECVD mechanism. ⸠CTE and Young's modules of silicon carbonitride films are calculated.
Related Topics
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Physical and Theoretical Chemistry
Authors
V.R. Shayapov, Yu.M. Rumyantsev, A.A. Dzyuba, B.M. Ayupov, N.I. Fainer,