| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5354026 | Applied Surface Science | 2013 | 7 Pages |
Abstract
⺠MgTiO3 thin films were grown on quartz and Pt-Si substrates by RF sputtering and MIM capacitors were fabricated at different O2%. ⺠The sputtering target was prepared by mechanical alloying for the first time. ⺠The effect of annealing and O2% on structural, microstructural, optical and dielectric properties was studied systematically. ⺠The increase in the refractive index and bandgap on annealing can be attributed to the improvement in packing density and crystallinity. ⺠The improvement in the dielectric properties is attributed to the increase in crystallinity and reduction in oxygen vacancies.
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Authors
T. Santhosh Kumar, R.K. Bhuyan, D. Pamu,