| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5354468 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠We investigated pattering processes of organic materials. ⺠We attempted to conduct a simplified model-based analysis of the CHF3/O2 plasma. ⺠A small addition of CHF3 to the O2 plasma produced a high etch rate. ⺠The surface energy was decreased with increasing fluorocarbon containing gas. ⺠The decreased surface energy is related to the functional groups of CFx polymer.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yong-Hyun Ham, Dmitriy Alexandrovich Shutov, Kwang-Ho Kwon,