Article ID Journal Published Year Pages File Type
5354743 Applied Surface Science 2012 5 Pages PDF
Abstract
► The experimental setup for the removal of nanoparticles using plasma shockwaves formed by a femtosecond pulsed laser. ► Removal of PSL nanoparticles from the silicon wafer surface as a function of the gap distance and particle counting. ► The removal efficiency of the nanoparticles reached 95% without surface damage when the gap distance was 150 μm.
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Authors
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