| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5354751 | Applied Surface Science | 2012 | 5 Pages |
Abstract
⺠A combination of electroless and electrochemical etching of silicon is introduced. ⺠A novel parameter called delay-time (Td) is optimized prior to applying pulsed current. ⺠The uniformity of fabricated porous silicon is enhanced by applying Td = 2 min. ⺠The optimized porous structures show a noticeable Raman shift with small FWHM, representing good crystalline quality. ⺠Efficient photodetectors are fabricated on nano-structured porous silicon by a combination of electroless and electrochemical etching of silicon substrate.
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Authors
N. Naderi, M.R. Hashim,