| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5354760 | Applied Surface Science | 2012 | 9 Pages |
Abstract
⺠The chemical stability of Y3(Al,Ga)5O12:Tb phosphor was tested under prolonged electron beam exposure. ⺠The CL intensity of the Y3(Al,Ga)5O12:Tb stabilized after removal of the chemisorbed species. ⺠X-ray photoelectron spectroscopy results suggested electron-beam induced formation of new interleave oxide layers. ⺠The interleave oxide layers acted as a protective layer inhibiting further CL intensity degradation. ⺠A lowering in the work function due to the new surface layers lead to an increase in the number of electrons for CL excitation.
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Authors
A. Yousif, H.C. Swart, O.M. Ntwaeaborwa,