| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355204 | Applied Surface Science | 2016 | 6 Pages |
Abstract
Thermal stability of structures (a) Cu/SiO2/Si and (b) Cu/Co/SiO2/Si, indicating that presence of thin cobalt layer improves the thermal stability of the structure up to 600 °C.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Sumit Sharma, Mukesh Kumar, Sumita Rani, Dinesh Kumar,