Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5355270 | Applied Surface Science | 2013 | 5 Pages |
Abstract
⺠We study hydrogenated amorphous Si/Ge multilayers annealed to form SiGe alloy. ⺠H is released from Si and Ge atoms on annealing. ⺠Annealing causes surface blistering. ⺠Released hydrogen is partially trapped in cavities that form blisters by increasing in size. ⺠Si di-hydrides are formed on the inner surfaces of the cavities/blisters.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
C. Frigeri, M. Serényi, A. Csik, Zs. Szekrényes, K. Kamarás, L. Nasi, N.Q. Khánh,