| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355458 | Applied Surface Science | 2011 | 5 Pages |
Abstract
⺠A highly adhered CrN film has been fabricated using a novel PBII&D technique based on high power pulsed magnetron discharge (HPPMS-PIII&D). ⺠The film exhibits a dense columnar structure and smooth, clean surface without macro-particles. ⺠The grains in the films have the face-center cubic (fcc) structure with highly (2 0 0) preferred orientation. ⺠The high-voltage pulse has a critical effect on the structure and properties of the prepared coatings for HPPMS-PIII&D.
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Authors
Zhongzhen Wu, Xiubo Tian, Zeming Wang, Chunzhi Gong, Shiqin Yang, Cher Ming Tan, Paul K. Chu,