| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355622 | Applied Surface Science | 2012 | 5 Pages |
Abstract
⺠TiN films thinner than 400 nm were grown at RT and 300 °C by PLD technique. ⺠Simulation of XRR curves acquired showed that TiN films were very dense and smooth. ⺠XRD spectra found that TiN were crystalline, with crystallites size from 10 to 35 nm and micro-strain values of 0.6-1.1%. ⺠Nanoindentation investigations found hardness values between 35 and 40 GPa.
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Authors
D. Craciun, N. Stefan, G. Socol, G. Dorcioman, E. McCumiskey, M. Hanna, C.R. Taylor, G. Bourne, E. Lambers, K. Siebein, V. Craciun,