| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355625 | Applied Surface Science | 2012 | 6 Pages |
Abstract
⺠We investigated effect of ultraviolet light exposure on p-type a-SiO:H films. ⺠Change in Urbach energy is lower for films with higher oxygen content. ⺠Hydrogen diffusion is lower for films with higher oxygen content. ⺠In higher oxides more OB bonds are converted to SiB bonds due to the UV light. ⺠Overall degradation of the films are lower for films with higher oxygen content.
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Authors
Seungsin Baek, S.M. Iftiquar, Juyeon Jang, Sunhwa Lee, Minbum Kim, Junhee Jung, Hyeongsik Park, Jinjoo Park, Youngkuk Kim, Chonghoon Shin, Youn-Jung Lee, Junsin Yi,