Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5355670 | Applied Surface Science | 2011 | 4 Pages |
Abstract
We achieved electron beam (e-beam) patterning without a photoresist on a Cl-terminated Si(0Â 0Â 1) surface. The Cl-Si bonds were easily broken by the irradiation with an e-beam of 1Â keV. We demonstrated the selective adsorption of desired molecules on the surface by e-beam irradiation in environments consisting of different gases, such as oxygen, ammonia, and 1-butanethiol.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
C. Jeon, H.-N. Hwang, H.-J. Shin, C.-Y. Park, C.-C. Hwang,