Article ID Journal Published Year Pages File Type
5355748 Applied Surface Science 2015 6 Pages PDF
Abstract
We identify that in addition to misfit also the oxygen partial pressure during PLD film growth influences film stress. PLD growth in an oxygen-free environment leads to factor of two increased tensile stress in SrTiO3 on Pt(0 0 1) as compared to growth at pO2=10−4 mbar. The role of film stoichiometry for film stress is discussed.
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Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
In situ stress measurements during pulsed laser deposition of BaTiO3 and SrTiO3 atomic layers on Pt(0 0 1)
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