| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355790 | Applied Surface Science | 2016 | 8 Pages |
Abstract
- A technology for GaSb surface cleaning is proposed.
- The technology combines ion sputtering, chemical etching, annealing for oxide removal.
- The ARXPS studies on GaSb surfaces are presented in a detailed manner.
- The surface stoichiometry is restored after recommended technology for contacting.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
C. Cotirlan, R.V. Ghita, C.C. Negrila, C. Logofatu, F. Frumosu, G.A. Lungu,