Article ID Journal Published Year Pages File Type
5355910 Applied Surface Science 2012 5 Pages PDF
Abstract
► We study laser-induced front and back side etching of fused silica with a KrF and a XeF excimer laser. ► Chromium layers as absorber are used. ► The LIFE method allows nm-precision etching with etching depths up to 300 nm. ► The measurement results are compared to the results calculated by a thermal model.
Keywords
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
Laser-induced front side and back side etching of fused silica with KrF and XeF excimer lasers using metallic absorber layers: A comparison
Authors
, , ,