Article ID Journal Published Year Pages File Type
5355982 Applied Surface Science 2011 4 Pages PDF
Abstract
► ITO films were deposited at room temperature. ► ITO films were treated by rapid thermal annealing (RTA) in vacuum. ► ITO films after annealed by RTA shows the lowest resistivity of 1.6 × 10−4 Ω cm. ► High transmittance (above 90%) is exhibited by the ITO films.
Keywords
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
Rapid thermal annealing of ITO films
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