| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355996 | Applied Surface Science | 2011 | 5 Pages |
Abstract
⺠Deformation mechanism of nanoimprint of Al thin film containing void is investigated by atomistic simulation. ⺠Void lowers critical force for initial dislocation nucleation, while hinders dislocation motion. ⺠Strong influence of void volume fraction on nanoimprint process. ⺠Critical void volume fraction for minimum degree of spring back is found.
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Authors
Ying Yuan, Tao Sun, Junjie Zhang, Yongda Yan,