| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5355999 | Applied Surface Science | 2011 | 4 Pages |
Abstract
⺠An ultrasonic spray assisted chemical vapor deposition (spray-CVD) method was developed to deposit ZnO thin films. ⺠The effect of hydrogen plasma irradiation on luminescence properties of ZnO thin films was studied by using a pulse-modulated inductively coupled plasma technique. ⺠UV emission of ZnO thin films can be greatly enhanced by hydrogen plasma irradiation with appropriate irradiation conditions because non-radiative centers are passivated by H.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
J.B. Wang, Z.S. Hu, X.L. Zhong, Y.J. Zhang, T. Ishigaki, T. Sekiguchi,