| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356170 | Applied Surface Science | 2012 | 4 Pages |
Abstract
⺠Highly c-axis oriented HT-LixCoO2 thin films are grown on (0 0 0 1) Al2O3 substrates by PLD. ⺠Deposition conditions change both surface roughness and resistivity of the thin films. ⺠The CP-AFM revealed very good surface roughness is an important issue in exploiting this material in novel devices. ⺠PLD is a promising technique for the growth of thin films of materials that contain volatile components.
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Authors
E. Svoukis, G.I. Athanasopoulos, A. Moradpour, O. Schneegans, A. Revcolevschi, J. Giapintzakis,