Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5356404 | Applied Surface Science | 2014 | 6 Pages |
Abstract
The pulsed electrodeposition method was employed for the deposition of pure Ni, Ni/Ag and Ni/Ag/Ni films due to its greater advantages while comparing with other methods. The X-ray diffraction pattern confirms the formation of fcc structure for both nickel and silver. The cross sectional scanning electron microscopy shows the layer formation in Ni/Ag and Ni/Ag/Ni films. The metallic nature of the nickel and silver were also confirmed using X-ray photoelectron spectroscopy. The magnetic anisotropy behaviour was studied using vibrating sample magnetometer which gives that the easy axis is in plan of the film for all the film.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
K. Dhanapal, T.A. Revathy, M. Anand Raj, V. Narayanan, A. Stephen,