| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356429 | Applied Surface Science | 2011 | 9 Pages |
Abstract
⺠CrSiN coatings were deposited on two substrates under different process condition using reactive magnetron sputtering technique. ⺠The coatings with low nitrogen content, 40% N2 has formed a crystalline structure consisting of nano-crystalline CrN, separated by an amorphous SiN phase. ⺠A less columnar growth is observed in CrSiN coatings deposited at low argon content, and with 3.67 at.% Si in the coatings. ⺠The morphology of the coatings becomes dense with increasing nitrogen content.
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Authors
Hetal N. Shah, R. Jayaganthan, Davinder Kaur,