Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5356478 | Applied Surface Science | 2011 | 7 Pages |
Abstract
⺠Highly smooth zinc oxide thin films were demonstrated. ⺠Chemical mechanical polishing process for zinc oxide was developed. ⺠Chemical and mechanical aspect of CMP process synergistically work to demonstrate high removal rates with high surface finish. ⺠Modified Preston's equation was proposed.
Related Topics
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Physical and Theoretical Chemistry
Authors
Sushant Gupta, Purushottam Kumar, A. Arul Chakkaravathi, Doina Craciun, Rajiv K. Singh,