| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356489 | Applied Surface Science | 2011 | 5 Pages |
Abstract
⺠Ni-rich NiO films and relatively pure NiO film were prepared by magnetron sputtering. ⺠The partial pressure of oxygen is a key condition for growing NiO films. ⺠Optical properties of the NiO films were investigated by spectroscopic ellipsometry. ⺠The partial pressure of oxygen influences the thickness and roughness of NiO films. ⺠Direct gap energy and indirect gap energy of the NiO films are also influenced.
Keywords
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
T.C. Peng, X.H. Xiao, X.Y. Han, X.D. Zhou, W. Wu, F. Ren, C.Z. Jiang,