Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5356489 | Applied Surface Science | 2011 | 5 Pages |
Abstract
⺠Ni-rich NiO films and relatively pure NiO film were prepared by magnetron sputtering. ⺠The partial pressure of oxygen is a key condition for growing NiO films. ⺠Optical properties of the NiO films were investigated by spectroscopic ellipsometry. ⺠The partial pressure of oxygen influences the thickness and roughness of NiO films. ⺠Direct gap energy and indirect gap energy of the NiO films are also influenced.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
T.C. Peng, X.H. Xiao, X.Y. Han, X.D. Zhou, W. Wu, F. Ren, C.Z. Jiang,