| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356655 | Applied Surface Science | 2014 | 8 Pages |
Abstract
In this contribution we discuss the possibilities, the key benefits and the limitations of three popular binary collision Monte Carlo simulation programs (SDTrimSP, TRIDYN and SRIM). The focus will be set to the calculation of angle dependent sputter yields, angular distribution of sputtered particles, sputter yields for compound materials, sputter yield amplification effects, as well as the extraction of parameters relevant for modeling ion-induced surface pattern formation from vacancy and recoil atom distributions.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
H. Hofsäss, K. Zhang, A. Mutzke,