| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356676 | Applied Surface Science | 2014 | 9 Pages |
Abstract
- It is a systematic study of various thicknesses (28-260Â nm) of Ag/Ni-Si silicide films.
- The temperature-dependent resistivity measurements of the films are studied.
- Resistivity variation of the films with temperature exhibits an unusual behavior.
- Parallel-resistor formula is reduced to Matthiessen's rule in this study.
- Reflection coefficients have been found in a wide temperature and thickness range.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
G. Utlu, N. Artunç,