| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356707 | Applied Surface Science | 2012 | 8 Pages |
Abstract
⺠Titanium nitride films with different nitrogen flow rates have been deposited at room temperature. ⺠The XRD results revealed the presence of strong FCC Ti (1 1 1) and TiN (2 0 0) phases. ⺠The XPS results shows presence of three groups of Ti 2p doublet. ⺠FESEM results showed a smooth morphology of the film with columnar grain structure. ⺠The electrical resistivity was found to decrease with the increase in nitrogen flow.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Nishat Arshi, Junqing Lu, Bon Heun Koo, Chan Gyu Lee, Faheem Ahmed,