| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356726 | Applied Surface Science | 2012 | 4 Pages |
Abstract
⺠Relief height in PMMA-DPPHA films of high aspect ratio are created by photoembossing. ⺠New mixtures for photoembossing are presented, containing greater monomer content. ⺠At high monomer contents, mixtures are solid at room temperature allowing mask exposure. ⺠Greater material flux during photo-polymerisation. ⺠This results in an increase in relief height by 50%.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
N.F. Hughes-Brittain, O.T. Picot, M. Dai, T. Peijs, C.W.M. Bastiaansen,