Structure and mechanical properties of TiC films deposited using combination of pulsed DC and normal DC magnetron co-sputtering

Article ID	Journal	Published Year	Pages	File Type
5356730	Applied Surface Science	2012	7 Pages	PDF

Abstract

âº Variation of preferred orientation with carbon content in the film. âº Variation of surface microstructure with Ti and C ratio. âº Coefficient of friction varies between 0.15 and 0.04 for all Ti and C ratio. âº Synthesis of TiC thin films using pulsed balanced magnetron sputtering. âº Better mechanical properties with reduced ion bombardment effect.

Keywords

TiC, Titanium carbide Preferred orientation Nanoindentation Nanocomposite

Related Topics

Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry

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Structure and mechanical properties of TiC films deposited using combination of pulsed DC and normal DC magnetron co-sputtering

Authors

K.H.T. Raman, M.S.R.N. Kiran, U. Ramamurty, G. Mohan Rao,