Characterization of delafossite-CuCrO2 thin films prepared by post-annealing using an atmospheric pressure plasma torch

► Dealfossite-CuCrO2 thin film was prepared using sol-gel processing and post-annealing with an atmospheric pressure plasma torch. ► X-ray diffraction pattern shows pure delafossite-CuCrO2 thin films can be obtained. ► The average transmittance of the film was 66% in the visible region and the direct optical bandgap was 3.08 eV. ► The electrical conductivity of the film was 2.7 × 10−2 Scm−1 with the carrier concentration of 2.8 × 1013 cm−3.