| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356796 | Applied Surface Science | 2012 | 4 Pages |
Abstract
⺠We deposit cupric/cuprous oxide thin films on a flexible substrate varying rf power. ⺠Preferential growth and the ratio of cupric and cuprous copper oxide was controlled by rf power. ⺠Different oxidation states and crystalline phase of Cu species were confirmed by X-ray induced Auger electron spectroscopy and XRD, respectively.
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Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Kyounga Lim, Juyun Park, Do-Geun Kim, Jong-Kuk Kim, Jae-Wook Kang, Yong-Cheol Kang,