Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5356843 | Applied Surface Science | 2011 | 4 Pages |
Abstract
Effects of the Hf content in Co-Hf-Ta thin films on the microstructure and magnetic properties were investigated in this study. It was found that appropriate Hf addition can effectively refine the Co grain size. Co grain sizes sharply decreased from 50 nm down to 2.3 nm with increasing the Hf content from 1.02 at.% to 2.81 at.%, leading to the reduced magneto-crystalline anisotropy. The Co-Hf-Ta thin films with small Co grains reveal low anisotropy field, low coercivity, and high resistivity. By optimizing the Hf content, the film with Hf concentration of 2.81 at.% exhibits excellent soft magnetic properties: high saturation magnetization (4ÏMS â¼Â 13.6 kG), and low coercivity (HC â¼Â 0.6 Oe). The effective permeability of the film reaches 800 and remains constant up to 1 GHz.
Related Topics
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Physical and Theoretical Chemistry
Authors
Shu-Wen Huang, Yuan-Tai Lai, Jenq-Gong Duh,