| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356884 | Applied Surface Science | 2011 | 5 Pages |
Abstract
A limited number of reports exists in the literature concerning the systematic study of the structural and optical properties of ZnO thin films, produced by pulsed laser ablation, in correlation with the deposition parameters adopted. In this paper we present a characterization of a sample prepared by this technique and studied by photoelectron spectroscopy and X-ray diffraction. The dielectric function of both target and films has been deduced by reflection electron energy loss spectroscopy.
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Authors
E. Fazio, A.M. Mezzasalma, G. Mondio, T. Serafino, F. Barreca, F. Caridi,