| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5356973 | Applied Surface Science | 2016 | 7 Pages |
Abstract
Schematic showing optimized gate patterning for (a) a slightly over-etched ONO mask profile on the α-Si dummy gate, (b) a top view of (a) showing a smooth sidewall, (c) α-Si dummy gate etch profile showing an almost perfectly steep shape and (d) a top view of (c) showing an uniform etch behavior.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Lingkuan Meng, Peizhen Hong, Xiaobin He, Chunlong Li, Junjie Li, Junfeng Li, Chao Zhao, Yayi Wei, Jiang Yan,