| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5357160 | Applied Surface Science | 2012 | 4 Pages |
Abstract
⺠We developed a new method of growing graphene-like thin films on glass substrates. ⺠Dual-frequency capacitively coupled plasma (DF-CCP) enhanced chemical vapor deposition (CVD) was used as the film growing method. ⺠Graphene-like films were grown at low temperature without using any metallic catalyst. ⺠The defects of films could be decreased and the crystal structure could be improved effectively by annealing treatment.
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Authors
Yijun Xu, Xuemei Wu, Chao Ye,