| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5357297 | Applied Surface Science | 2010 | 5 Pages |
Abstract
Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450:1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos.
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Authors
Sachin Attavar, Mohit Diwekar, Matthew R. Linford, Mark A. Davis, Steve Blair,