| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5357400 | Applied Surface Science | 2012 | 10 Pages |
Abstract
⺠A non-HF based solution was developed to elaborate different shapes of Si nanostructures by the metal-assisted chemical etching process. ⺠Metal-assisted electroless etching of silicon was investigated in new chemical solution containing NH4HF2. ⺠It was shown that silicon nanowires are fabricated either by one-step or two-step metal-assisted chemical etchings. ⺠It was shown that the increase of NH4HF2 in the etching solution leads to the increase of etching rate.
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Authors
Naima Brahiti, Sihem-Aissiou Bouanik, Toufik Hadjersi,