Article ID Journal Published Year Pages File Type
5357424 Applied Surface Science 2012 4 Pages PDF
Abstract
► Etching Si/SiO2 wafer with 48-50% HF generates SiO2 nanoparticles. ► Metal-catalyst-free growth of CNTs on SiO2 nanoparticles is demonstrated. ► TEM shows the presence of SWCNTs on Si/SiO2 wafer etched at 1 min after CVD.
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Authors
, , ,