Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5357424 | Applied Surface Science | 2012 | 4 Pages |
Abstract
⺠Etching Si/SiO2 wafer with 48-50% HF generates SiO2 nanoparticles. ⺠Metal-catalyst-free growth of CNTs on SiO2 nanoparticles is demonstrated. ⺠TEM shows the presence of SWCNTs on Si/SiO2 wafer etched at 1 min after CVD.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Lling-Lling Tan, Siang-Piao Chai, Abdul Rahman Mohamed,