| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5357455 | Applied Surface Science | 2015 | 6 Pages |
Abstract
- V films of 50, 75, 100Â nm thickness were deposited on Si by RF magnetron sputtering.
- We studied structural/mechanical properties by XRD, FE-SEM, AFM, and nanoindentation.
- The hardness increased from 9.0 to 14.0Â GPa for 100 to 50Â nm.
- The modulus showed no correlation with thickness or native oxide formation.
- Native oxide formation resulted in grain enlargement and roughness reduction.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
M.A. Mamun, K. Zhang, H. Baumgart, A.A. Elmustafa,