Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5357461 | Applied Surface Science | 2015 | 5 Pages |
Abstract
By performing in situ growth studies during pulsed laser deposition, we observed a strong reduction of the surface diffusion coefficients for slightly non-stoichiometric SrTiO3. Both, stoichiometric and non-stoichiometric thin films exhibit 2D layer by layer growth. However, in the non-stoichiometric case the 2D island coalescence is significantly delayed, which goes along with a shift of the reflection high electron energy diffraction (RHEED) minimum. We could explain this shift of the RHEED minimum by developing a model for the step density evolution taking into account finite surface diffusion.
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Authors
Chencheng Xu, Marco Moors, Regina Dittmann,