Article ID Journal Published Year Pages File Type
5357538 Applied Surface Science 2015 5 Pages PDF
Abstract
There was a significant difference in the CMP performance of 6H-SiC between silica and ceria based slurries. For the ceria based slurries, a higher MRR was obtained, especially in strong acid KMnO4 environment.
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Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
Performance of colloidal silica and ceria based slurries on CMP of Si-face 6H-SiC substrates
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