| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5358657 | Applied Surface Science | 2011 | 6 Pages |
Abstract
⺠Applying a homogenous plane-stress using the Nano-Imprint System on the SDB process. ⺠Highly consistent interface energy of SDB pairs when applying a homogenous plane-stress. ⺠Improves bonding quality of point-stress bonded wafers by re-applying a plane-stress with Nano-Imprint System.
Related Topics
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Chemistry
Physical and Theoretical Chemistry
Authors
Li-Yang Huang, Kuan-Lin Ho, Chen-Ti Hu,