| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5358674 | Applied Surface Science | 2011 | 5 Pages |
Abstract
⺠We report preparation of Mg2Si films by magnetron sputtering method. ⺠We report effect of deposited Mg film thickness on formation. ⺠We report effect of annealing temperature on formation. ⺠High quality Mg2Si films are prepared directly by annealing at 400 °C for 5 h. ⺠The texture of Mg2Si films becomes dense as deposited Mg film thickness increases.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Qingquan Xiao, Quan Xie, Xiangqian Shen, Jinmin Zhang, Zhiqiang Yu, Kejie Zhao,