| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5358691 | Applied Surface Science | 2011 | 6 Pages |
Abstract
⺠ZnO thin films grown on Si(1 1 1) substrates by ALD and followed by RTA. ⺠XRD shows that the annealed ZnO films had a predominant (0 0 2) orientation. ⺠PL show manifest enhanced in intrinsic band edge UV emission of annealed ZnO films. ⺠Hardness of annealed ZnO films follows satisfactorily with the Hall-Petch equation.
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Authors
C.-Y. Yen, S.-R. Jian, G.-J. Chen, C.-M. Lin, H.-Y. Lee, W.-C. Ke, Y.-Y. Liao, P.-F. Yang, C.-T. Wang, Y.-S. Lai, Jason S.-C. Jang, J.-Y. Juang,