Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5358703 | Applied Surface Science | 2014 | 4 Pages |
Abstract
Very thin ZrC and ZrN films (<500 nm) were grown on (1 0 0) Si substrates at 500 °C by the pulsed laser deposition (PLD) technique using a KrF excimer laser. X-ray reflectivity investigations showed that films exhibited mass densities similar to bulk values. X-ray diffraction investigations found that films were nanocristalline, exhibited a (1 1 1) texture and high micro-strain values. Auger electron spectroscopy investigations indicated that films contained in bulk a relatively low oxygen concentration, usually below 2.0%. Atomic force microscopy found that ZrN films deposited under 2 Ã 10â2 Pa of N2 exhibited a very smooth surface, with an rms value of only 3 Ã
, while wear tests found a low wear rate of only 4.5Â ÃÂ 10â6Â mm3/NÂ m.
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Authors
G. Dorcioman, G. Socol, D. Craciun, N. Argibay, E. Lambers, M. Hanna, C.R. Taylor, V. Craciun,