| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5358864 | Applied Surface Science | 2011 | 5 Pages |
Abstract
ⶠWe report the structural properties and electrical characteristics of thin Dy2O3 dielectrics deposited on Si substrates through reactive sputtering. ⶠThe structural and morphological features of these films after postdeposition annealing were studied by X-ray diffraction and X-ray photoelectron spectroscopy. ⶠWe found that Dy2O3 dielectrics annealed at 700 °C exhibit a thinner capacitance equivalent thickness and better electrical properties.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Tung-Ming Pan, Wei-Tsung Chang, Fu-Chien Chiu,