Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5358869 | Applied Surface Science | 2011 | 6 Pages |
Abstract
â¶ In this paper we report detail investigation and correlation between micro-structural and optical properties of nano-crystalline silicon (nc-Si) deposited by plasma enhancement chemical vapor deposition (PECVD) on porous aluminum structure. â¶ The effect of anodisation currents on the microstructure of aluminium surface layer and nc-Si films was systematically studied by Atomic Force Microscopy (AFM) and Tranmission Electron microscopy (TEM), Raman spectroscopy and X-ray diffraction (XRD). â¶ The optical constants (n and k as a function of wavelength) of the films were obtained using variable angle spectroscopic ellipsometry (SE) in the UV-vis-NIR regions.
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Authors
M. Ghrib, M. Gaidi, N. Khedher, T. Ghrib, M. Ben Salem, H. Ezzaouia,